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Solar Enhancement Technology Featured in Innovation Magazine
ENABLE deposits on or etches surfaces using a neutral atom beam.
The R&D 100 Award winning ENABLE technology is featured in Innovation Magazine's October/November issue. ENABLE stands for Energetic Neutral Atom Beam Lithography & Epitax. Employing an energetic collimated beam of neutral nitrogen or oxygen atoms, ENABLE comprises a dual-function nanofabrication technology capable of both growing thin films and etching high-aspect-ratio nanostructures. It is unique in that its low-temperature operation spares the activation of diffusive and other unwanted surface chemical changes that are drawbacks of existing nanofabrication processes.
The Innovation article describes a collaboration between the ENABLE team in Chemistry Division (PI Mark Hoffbauer) and RoseStreet Labs Energy, Inc. The collaboration targets using ENABLE to grow thin films that will convert more of the sun’s energy into usable electrical current than previously thought possible.
Read the complete article at: http://www.innovation-america.org/index.php?articleID=465
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